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1 physical vapor deposition
термовакуумне осадження з парової фазиEnglish-Ukrainian dictionary of microelectronics > physical vapor deposition
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2 deposition
осадження - blanket deposition
- chemical deposition
- chemical vapor deposition
- diffusional deposition
- dynamic deposition
- electrochemical deposition
- electroless deposition
- electrolythic deposition
- electron-beam deposition
- epitaxial deposition
- evaporation deposition
- evaporative deposition
- excimer-induced deposition
- film deposition
- gas deposition
- glow-discharge deposition
- high-rate deposition
- ion-beam induced deposition
- ion-beam deposition
- ionized-cluster beam deposition
- laser gold deposition
- laser-induced deposition
- laser photo-assisted deposition
- laser photochemical deposition
- localized electrochemical deposition LED
- localized electrochemical deposition
- low-pressure chemical vapor deposition LPCVD
- low-pressure chemical vapor deposition
- low-temperature vapor deposition
- metal deposition
- metall-organic deposition
- microcrystalline like deposition
- microwave plasma reactive vapor deposition
- molecular-beam deposition
- multiple-stage deposition
- oblique deposition
- open-tube deposition
- photochemical deposition
- photo-initiated deposition
- photolytic deposition
- photon-controlled deposition
- physical vapor deposition
- plasma-assisted laser deposition
- pyrolytic deposition
- serigraphic deposition
- sputter deposition
- static deposition
- thin-film deposition
- vacuum vapor deposition
- vapor-phasedeposition
- vapordepositionEnglish-Ukrainian dictionary of microelectronics > deposition
См. также в других словарях:
Physical vapor deposition — (PVD) is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces (e.g., onto semiconductor wafers). The… … Wikipedia
Physical vapor deposition — Physical vapor deposition. См. Осаждение из паровой фазы. (Источник: «Металлы и сплавы. Справочник.» Под редакцией Ю.П. Солнцева; НПО Профессионал , НПО Мир и семья ; Санкт Петербург, 2003 г.) … Словарь металлургических терминов
physical vapor deposition — fizikinis garinis nusodinimas statusas T sritis radioelektronika atitikmenys: angl. physical vapor deposition vok. physikalische Gasphasenabscheidung, f rus. физическое осаждение из паровой фазы, n pranc. déposition physique en phase vapeur, f;… … Radioelektronikos terminų žodynas
Physical vapor deposition — Der Begriff physikalische Gasphasenabscheidung (englisch physical vapour deposition, kurz PVD) bezeichnet eine Gruppe von vakuumbasierten Beschichtungsverfahren bzw. Dünnschichttechnologien, bei denen im Gegensatz zu CVD Verfahren die Schicht… … Deutsch Wikipedia
Physical Vapor Deposition — A method of depositing thin semiconductor photovoltaic) films. With this method, physical processes, such as thermal evaporation or bombardment of ions, are used to deposit elemental semiconductor material on a substrate … Energy terms
Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… … Wikipedia
Electron beam physical vapor deposition — Traduction à relire Electron beam physical vapor deposition → … Wikipédia en Français
Vapor deposition — can refer to: * Chemical vapor deposition * Physical vapor deposition … Wikipedia
Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in … Wikipedia
Hybrid Physical-Chemical Vapor Deposition — (HPCVD) is a thin film deposition technique that combines physical vapor deposition (PVD) with chemical vapor deposition (CVD). For the instance of magnesium diboride (MgB2) thin film growth, HPCVD process uses diborane (B2H6) as the boron… … Wikipedia
Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v … Wikipedia